Large area imprinting and sub 50 nm resolution
SCIL brings breakthrough technology providing the best of both worlds in a unique combination.

MiPlaza offers SCIL (Substrate Conformal Imprint Lithography), a unique technique that bridges the gap between small rigid stamp NIL (nano imprint lithography) and large-area soft stamp usage. SCIL has been designed for sub 50 nm patterning, and delivers excellent printing resolution and repeatabilty.

SCIL's excellent performance in terms of substrate conformity and pattern fidelity over large areas makes it a powerful tool especially useful for applications like high brightness LEDs, high-efficient laser diodes or BPM (bit patterned media) for next-generation hard disc drives.

The SCIL technique has been developed by Philips Research and is now available as part of MiPlaza's range of services. It is also available as an upgrade kit for manual mask aligners from SUSS MicroTec, under the terms of a technology license agreement with Philips.